Logo

Description automatically generated
विद्यार्जन
 संसाधन केंद्र, भारतीय प्रौद्योगिकी संस्थान इन्दौर
Learning Resource Center, Indian Institute of Technology Indore

ऑनलाइन सार्वजनिक अभिगम प्रसूची
Online Public Access Catalogue (OPAC)

Amazon cover image
Image from Amazon.com
Image from Coce

Behind the mask of chivalry : The making of the second Ku Klux Klan

By: Material type: TextTextPublication details: Oxford Oxford University Press 1995Description: xvii, 292p. ; 22 cmISBN:
  • 9780195098365
Subject(s): DDC classification:
  • 322.420975818 MAC
Item type: Book
Holdings
Item type Home library Call number Status Barcode
Book Book LRC, IIT Indore 3rd Floor - General Stack 322.420975818 MAC (Browse shelf(Opens below)) Available 34710
Total holds: 0
Copyright © 2024, 2021, 2017 Indian Institute of Technology Indore. All Rights Reserved.
Managed & maintained by Learning Resource Center, IIT Indore