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	1.	MOS (Metal oxide semiconductor) physics and technology by Nicollian, E.H Brews, J.R Material type: Text Publication details: New Jersey John Wiley & Sons 2003 Availability: Items available for loan: LRC, IIT Indore (1)Location, call number: 2nd Floor - General Stack 621.38152 NIC. Place hold Add to cart (remove)
	2.	MOS (Metal oxide semiconductor) physics and technology by Nicollian, E.H Brews, J.R Material type: Text Publication details: New Jersey John Wiley & Sons 2003 Availability: Items available for loan: LRC, IIT Indore (1)Location, call number: 2nd Floor - General Stack 621.38152 NIC. Place hold Add to cart (remove)
	3.	MOS (Metal oxide semiconductor) physics and technology by Nicollian, E.H Brews, J.R Material type: Text Publication details: New Jersey John Wiley & Sons 2003 Availability: Items available for loan: LRC, IIT Indore (1)Location, call number: 2nd Floor - General Stack 621.38152 NIC. Place hold Add to cart (remove)
	4.	MOS (Metal oxide semiconductor) physics and technology by Nicollian, E.H Brews, J.R Material type: Text Publication details: New Jersey John Wiley & Sons 2003 Availability: Items available for loan: LRC, IIT Indore (1)Location, call number: 2nd Floor - General Stack 621.38152 NIC. Place hold Add to cart (remove)
	5.	MOS (Metal oxide semiconductor) physics and technology by Nicollian, E.H Brews, J.R Material type: Text Publication details: New Jersey John Wiley & Sons 2003 Availability: Items available for loan: LRC, IIT Indore (1)Location, call number: 2nd Floor - General Stack 621.38152 NIC. Place hold Add to cart (remove)

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